NV-1
Indium Sputtering Equipment
NV-1
PARAMETERS
Product heating temperature
100 ÷ 350 ° C
Quantity of sputtered products
up to 24 pcs
Quantity of ion sources
1 piece
Quantity of magnetron sources
2 pcs
Quantity of indium sputtering devices
1 piece
Oven heating temperature
up to 260 ° C
Working pressure
5•10-4 Pa
Ultimate pressure in the working chamber
1•10-4 Pa
Time to achieve a working pressure
40 minutes
Cycle duration
5 hours
Process
automation
Power consumption
8 kW
Dimensions (L • W • H)
1380 • 750 • 2100 mm
Weight
350 kg
Indium sputtering equipment is intended for application in one cycle, without opening the working chamber to atmosphere, two coatings with magnetron sputtering and a metered quantity of indium.
Requirements:
• Industrial water under pressure (0.2 ÷ 0.5) MPa, flow rate - 0.5 m3 / h., Temperature, max - 25 ° С;
• compressed air under pressure (0.4 ÷ 0.8) MPa;
• gaseous argon UHP under pressure (0.2 ÷ 0.4) MPa;
• gaseous nitrogen under pressure (0.1 ÷ 0.2) MPa;
• gaseous helium under pressure (0.1 ÷ 0.2) MPa;
• water drain, flow rate, min - 0.5 m3 / h.
